Permittivity Characterization of Low-k Thin films from Transmission-Line Measurements

Published

January 1, 2003

Author(s)

Michael D. Janezic, Dylan Williams, V. Blaschke, A. Karamcheti, Fengbo Hang

Abstract

We develop a broadband technique for measuring the permittivity of low-k thin films using microstrip transmission-line measurements. From measurements of the complex microstrip propagation constant and the characteristics impedance, we determine the permittivity of thin films incorporated in microstrip lines. We present measurement results to 40GHz for both an oxide and a bisbenzocyclobutene (BCB) low-k thin film and show a variability of permittivity of about =/- 5% over the entire frequency range.

Citation

IEEE Transactions on Microwave Theory and Techniques

Volume

51

Issue

1

Pub Type

Journals

Download Paper

DOI Link

Keywords

dielectric constant, low-k, measurement, microstrip, permittivity, thin film, transmission line

Citation

Janezic, M. , Williams, D. , Blaschke, V. , Karamcheti, A. and Hang, F. (2003), Permittivity Characterization of Low-k Thin films from Transmission-Line Measurements, IEEE Transactions on Microwave Theory and Techniques, [online], https://doi.org/10.1109/TMTT.2002.806925 (Accessed October 10, 2025)