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Permittivity Characterization of Low-k Thin films from Transmission-Line Measurements

Published

Author(s)

Michael D. Janezic, Dylan Williams, V. Blaschke, A. Karamcheti, Fengbo Hang

Abstract

We develop a broadband technique for measuring the permittivity of low-k thin films using microstrip transmission-line measurements. From measurements of the complex microstrip propagation constant and the characteristics impedance, we determine the permittivity of thin films incorporated in microstrip lines. We present measurement results to 40GHz for both an oxide and a bisbenzocyclobutene (BCB) low-k thin film and show a variability of permittivity of about =/- 5% over the entire frequency range.
Citation
IEEE Transactions on Microwave Theory and Techniques
Volume
51
Issue
1

Keywords

dielectric constant, low-k, measurement, microstrip, permittivity, thin film, transmission line

Citation

Janezic, M. , Williams, D. , Blaschke, V. , Karamcheti, A. and Hang, F. (2003), Permittivity Characterization of Low-k Thin films from Transmission-Line Measurements, IEEE Transactions on Microwave Theory and Techniques, [online], https://doi.org/10.1109/TMTT.2002.806925 (Accessed May 28, 2024)

Issues

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Created December 31, 2002, Updated October 12, 2021