Geist, J.
, Kohler, T.
, Goebel, R.
, Robinson, A.
and James, C.
(1991),
Numerical Modeling of Silicon Photodiodes for High-Accuracy Applications. Part II: Interpreting Oxide-Bias Experiments, Journal of Research (NIST JRES), National Institute of Standards and Technology, Gaithersburg, MD
(Accessed February 16, 2025)
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Numerical Modeling of Silicon Photodiodes for High-Accuracy Applications. Part II: Interpreting Oxide-Bias Experiments
Published
Author(s)
, Tina Kohler, R. Goebel, A. M. Robinson, C. James
Citation
Journal of Research (NIST JRES) -
NIST Pub Series
Pub Type
NIST Pubs
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created August 29, 1991, Updated October 12, 2021