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Numerical Modeling of Silicon Photodiodes for High-Accuracy Applications. Part II: Interpreting Oxide-Bias Experiments

Published

Author(s)

Jon Geist, Tina Kohler, R. Goebel, A. M. Robinson, C. James
Citation
Journal of Research (NIST JRES) -

Citation

Geist, J. , Kohler, T. , Goebel, R. , Robinson, A. and James, C. (1991), Numerical Modeling of Silicon Photodiodes for High-Accuracy Applications. Part II: Interpreting Oxide-Bias Experiments, Journal of Research (NIST JRES), National Institute of Standards and Technology, Gaithersburg, MD (Accessed March 28, 2024)
Created August 29, 1991, Updated October 12, 2021