Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

New Developments in Deep Ultraviolet Laser Metrology for Photolithography

Published

Author(s)

Marla L. Dowell, Christopher L. Cromer, Richard D. Jones, Darryl A. Keenan, Thomas Scott

Abstract

Current and future laser measurement services at 157, 193, and 248 nm will be reviewed. Laser power and energy measurements at 193 nm will be presented, electrical calibration issues will be reviewed. We report an overall calibration uncertainty of laser power and energy meters of less than 2%. Characterization measurement for ultraviolet materials also will be discussed.
Citation
SME Tech. Note
Issue
MS00-236

Keywords

laser metrology, UV lithography

Citation

Dowell, M. , Cromer, C. , Jones, R. , Keenan, D. and Scott, T. (2000), New Developments in Deep Ultraviolet Laser Metrology for Photolithography, SME Tech. Note, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=229 (Accessed June 22, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created December 31, 1999, Updated October 12, 2021