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New Developments in Deep Ultraviolet Laser Metrology for Photolithography



Marla L. Dowell, Christopher L. Cromer, Richard D. Jones, Darryl A. Keenan, Thomas Scott


Current and future laser measurement services at 157, 193, and 248 nm will be reviewed. Laser power and energy measurements at 193 nm will be presented, electrical calibration issues will be reviewed. We report an overall calibration uncertainty of laser power and energy meters of less than 2%. Characterization measurement for ultraviolet materials also will be discussed.
SME Tech. Note


laser metrology, UV lithography


Dowell, M. , Cromer, C. , Jones, R. , Keenan, D. and Scott, T. (2000), New Developments in Deep Ultraviolet Laser Metrology for Photolithography, SME Tech. Note, [online], (Accessed June 22, 2024)


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Created December 31, 1999, Updated October 12, 2021