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PUBLICATIONS

New Developments in Deep Ultraviolet Laser Metrology for Photolithography

Published

Author(s)

Marla L. Dowell, Christopher L. Cromer, Richard D. Jones, Darryl A. Keenan, Thomas Scott

Abstract

Current and future laser measurement services at 157, 193, and 248 nm will be reviewed. Laser power and energy measurements at 193 nm will be presented, electrical calibration issues will be reviewed. We report an overall calibration uncertainty of laser power and energy meters of less than 2%. Characterization measurement for ultraviolet materials also will be discussed.
Citation
SME Tech. Note
Issue
MS00-236
Pub Type
Others

Download Paper

Local Download

Keywords

laser metrology, UV lithography

Citation

Dowell, M. , Cromer, C. , Jones, R. , Keenan, D. and Scott, T. (2000), New Developments in Deep Ultraviolet Laser Metrology for Photolithography, SME Tech. Note, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=229 (Accessed April 18, 2024)

Created December 31, 1999, Updated October 12, 2021