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Nanoelectronics Lithography

Published

Author(s)

Stephen Knight, Vivek Prabhu, John H. Burnett, James Alexander Liddle, Christopher Soles, Alain C. Diebold

Abstract

This is a compiled chapter that will be included into the Handbook of Nanophysics.
Citation
Handbook of Nanophysics
Publisher Info
Taylor & Francis, London, -1

Keywords

lithography, photoresist, electron beam, nanoimprint, metrology, DUV, EUV, ITRS roadmap

Citation

Knight, S. , Prabhu, V. , Burnett, J. , Liddle, J. , Soles, C. and Diebold, A. (2011), Nanoelectronics Lithography, Handbook of Nanophysics, Taylor & Francis, London, -1, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=901888 (Accessed May 21, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created February 28, 2011, Updated October 14, 2021