Bertness, K.
, Hays, S.
and Hickernell, R.
(1999),
Multifunctional Optical In Situ Monitoring of Semiconductor Film Growth, Proc., Mat. Res. Soc. Symp. on Epitaxial Growth-Principles and Applications, San Francisco, CA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=24323
(Accessed April 25, 2024)
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Multifunctional Optical In Situ Monitoring of Semiconductor Film Growth
Published
Author(s)
, S. P. Hays,
Abstract
We have modifed a normal-incidence optical reflectance spectroscopy system to allow rapid switching between the measurement of sample reflectance and sample emission.Proceedings Title
Proc., Mat. Res. Soc. Symp. on Epitaxial Growth-Principles and Applications
Volume
570
Issue
18
Conference Dates
April 5-8, 1999
Conference Location
San Francisco, CA
Pub Type
Conferences
Download Paper
Keywords
in situ monitoring, molecular beam epitaxy, pyrometry, reflectance spectroscopy
Citation
Created August 31, 1999, Updated October 12, 2021