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Michromachined Array Studies of Tin Oxide Films: Nucleation, Structure and Gas Sensing Characteristics

Published

Author(s)

Stephen Semancik, Richard E. Cavicchi, B Panchapakesan, R M. Walton

Abstract

Growth of tin oxide by micro-chemical vapor deposition has been investigated as a function of type and thickness of seeding layers using four-element arrays of
Citation
Materials Research Society Symposium
Volume
574

Keywords

chemical vapor deposition, gas sensing, micromachined arrays, nucleation, self-lithography, thin films, tin oxide

Citation

Semancik, S. , Cavicchi, R. , Panchapakesan, B. and Walton, R. (1999), Michromachined Array Studies of Tin Oxide Films: Nucleation, Structure and Gas Sensing Characteristics, Materials Research Society Symposium, [online], https://doi.org/10.1557/PROC-574-213 (Accessed April 23, 2024)
Created April 7, 1999, Updated November 10, 2018