NOTICE: Due to a lapse in annual appropriations, most of this website is not being updated. Learn more.
Form submissions will still be accepted but will not receive responses at this time. Sections of this site for programs using non-appropriated funds (such as NVLAP) or those that are excepted from the shutdown (such as CHIPS and NVD) will continue to be updated.
An official website of the United States government
Here’s how you know
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Michromachined Array Studies of Tin Oxide Films: Nucleation, Structure and Gas Sensing Characteristics
Published
Author(s)
Stephen Semancik, Richard E. Cavicchi, B Panchapakesan, R M. Walton
Abstract
Growth of tin oxide by micro-chemical vapor deposition has been investigated as a function of type and thickness of seeding layers using four-element arrays of
chemical vapor deposition, gas sensing, micromachined arrays, nucleation, self-lithography, thin films, tin oxide
Citation
Semancik, S.
, Cavicchi, R.
, Panchapakesan, B.
and Walton, R.
(1999),
Michromachined Array Studies of Tin Oxide Films: Nucleation, Structure and Gas Sensing Characteristics, Materials Research Society Symposium, [online], https://doi.org/10.1557/PROC-574-213
(Accessed October 7, 2025)