Martinez, J.
, Dagata, J.
, Richter, C.
and Silver, R.
(2004),
Metrology Development for the Nanoelectronics Industry at the National Institute of Standards and Technology, 2004 Nanotechnology Conference and Trade Show, Boston, MA, USA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=31539
(Accessed December 15, 2024)
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Metrology Development for the Nanoelectronics Industry at the National Institute of Standards and Technology
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Abstract
The National Institute of Standards and Technology has provided and continues to provide critical metrology development for the semiconductor manufacturing industry as it moves from the microelectronic era into the nanoelectronic era. This presentaion will describe the National Semiconductor Metrology Program, including a detailed discussion of several projects: Nanolithography Using Scanning Probe Oxidation; Atomic-Level Film Characterization; and Nanoelectronic Device Characterization.Volume
3
Conference Dates
March 7-11, 2004
Conference Location
Boston, MA, USA
Conference Title
2004 Nanotechnology Conference and Trade Show
Pub Type
Conferences
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Keywords
gate dielectrics, molecular electronics, nanoelectronics, nanolithography, thin films
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created March 6, 2004, Updated October 12, 2021