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Metrology Development for the Nanoelectronics Industry at the National Institute of Standards and Technology

Published

Author(s)

Joaquin (. Martinez, John A. Dagata, Curt A. Richter, Richard M. Silver

Abstract

The National Institute of Standards and Technology has provided and continues to provide critical metrology development for the semiconductor manufacturing industry as it moves from the microelectronic era into the nanoelectronic era. This presentaion will describe the National Semiconductor Metrology Program, including a detailed discussion of several projects: Nanolithography Using Scanning Probe Oxidation; Atomic-Level Film Characterization; and Nanoelectronic Device Characterization.
Volume
3
Conference Dates
March 7-11, 2004
Conference Location
Boston, MA, USA
Conference Title
2004 Nanotechnology Conference and Trade Show

Keywords

gate dielectrics, molecular electronics, nanoelectronics, nanolithography, thin films

Citation

Martinez, J. , Dagata, J. , Richter, C. and Silver, R. (2004), Metrology Development for the Nanoelectronics Industry at the National Institute of Standards and Technology, 2004 Nanotechnology Conference and Trade Show, Boston, MA, USA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=31539 (Accessed April 19, 2024)
Created March 6, 2004, Updated October 12, 2021