Chandler-Horowitz, D.
, Nguyen, N.
, Marchiando, J.
and Amirtharaj, P.
(1993),
Metrologic Support for the DARPANRL-XRL Mask Program::ellipsometric analyses of SiC thin films on Si, , National Institute of Standards and Technology, Gaithersburg, MD, [online], https://doi.org/10.6028/NIST.IR.4860
(Accessed December 10, 2024)
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Metrologic Support for the DARPANRL-XRL Mask Program::ellipsometric analyses of SiC thin films on Si
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- NIST IR 4860
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NIST IR 4860
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NIST Pubs
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Created January 1, 1993, Updated May 19, 2023