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Magnetic depth profiling Co/Cu multilayers to investigate magnetoresistance (invited)

Published

Author(s)

D. Tulchinsky, Michael H. Kelley, J. Bass, John Unguris, Joseph Dura, Julie Borchers, Charles Majkrzak, S. Y. Hsu, R. Loloee, W. P. Pratt
Citation
Journal of Applied Physics
Volume
87
Issue
9

Citation

Tulchinsky, D. , Kelley, M. , Bass, J. , Unguris, J. , Dura, J. , Borchers, J. , Majkrzak, C. , Hsu, S. , Loloee, R. and Pratt, W. (2000), Magnetic depth profiling Co/Cu multilayers to investigate magnetoresistance (invited), Journal of Applied Physics, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=32588 (Accessed July 13, 2024)

Issues

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Created April 30, 2000, Updated October 12, 2021