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PUBLICATIONS

Interferometric metrology of photomask blanks::approaches using 633 nm wavelength

Published

Author(s)

C J Evans, A D Davies, R E Parks, L-Z Shao
Citation
- NIST IR 6701
Report Number
NIST IR 6701
Pub Type
NIST Pubs

Download Paper

DOI Link

Citation

Evans, C. , Davies, A. , Parks, R. and Shao, L. (2000), Interferometric metrology of photomask blanks::approaches using 633 nm wavelength, , National Institute of Standards and Technology, Gaithersburg, MD, [online], https://doi.org/10.6028/NIST.IR.6701 (Accessed October 6, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created January 1, 2000, Updated May 20, 2023