Evans, C.
, Davies, A.
, Parks, R.
and Shao, L.
(2000),
Interferometric metrology of photomask blanks::approaches using 633 nm wavelength, , National Institute of Standards and Technology, Gaithersburg, MD, [online], https://doi.org/10.6028/NIST.IR.6701
(Accessed April 28, 2024)
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Interferometric metrology of photomask blanks::approaches using 633 nm wavelength
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- NIST IR 6701
Report Number
NIST IR 6701
Pub Type
NIST Pubs
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Created January 1, 2000, Updated May 20, 2023