@misc{1202891,
  author = {C J Evans and A D Davies and R E Parks and L-Z Shao},
  title = {Interferometric metrology of photomask blanks::approaches using 633 nm wavelength},
  year = {2000},
  month = {2000-01-01 05:01:00},
  publisher = {, National Institute of Standards and Technology, Gaithersburg, MD},
  doi = {https://doi.org/10.6028/NIST.IR.6701},
  language = {en},
}