TY  - GEN
AU  - C J Evans
AU  - A D Davies
AU  - R E Parks
AU  - L-Z Shao
C2  - , National Institute of Standards and Technology, Gaithersburg, MD
DA  - 2000-01-01 05:01:00
DO  - https://doi.org/10.6028/NIST.IR.6701
LA  - en
PB  - , National Institute of Standards and Technology, Gaithersburg, MD
PY  - 2000
TI  - Interferometric metrology of photomask blanks::approaches using 633 nm wavelength
ER  -