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High Resolution X-ray Scattering Methods for ULSI Materials Characterization and Metrology for ULSI Technology

Published

Author(s)

R J. Matyi

Abstract

X-ray analytical methods with high angular resolution are becoming increasingly important for the characterization of materials used in ULSI fabrication. Vendors now market state-of-the art X-ray tools for the routine analysis of parameters such as layer thickness, chemical composition, strain relaxation, and interfacial roughness. The recent integration of X-ray diffraction and reflectivity systems into fab-compatible process metrology tools suggests that the importance of these techniques will only increase with time. Here we discuss some basic principles of high resolution X-ray methods (notably double- and triple-axis X-ray diffractometry and high resolution X-ray reflectometry) and will describe the capabilities and limitations of these tools for ULSI materials. Reference will be made to real-life problems involving bulk and thin-film structures (ranging from amorphous dielectrics and polycrystalline metals to highly perfect epitaxial single crystal materials) to show both the utility and the shortcomings of high resolution X-ray methods.
Citation
International Conference on Characterization and Metrology for ULSI Technology

Keywords

X-ray, X-ray analytical methods, X-ray diffraction, X-ray methods, X-ray methods, X-reflectometry

Citation

Matyi, R. (2008), High Resolution X-ray Scattering Methods for ULSI Materials Characterization and Metrology for ULSI Technology, International Conference on Characterization and Metrology for ULSI Technology (Accessed March 1, 2024)
Created October 16, 2008