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Frontiers of Characterization and Metrology for Nanoelectronics: 2017

Published

Author(s)

Erik M. Secula, David G. Seiler

Abstract

The 2017 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (FCMN) has the goal of bringing together scientists and engineers interested in all aspects of the characterization and measurement technology needed for nanoelectronic materials and device research, development, and manufacturing. All approaches are welcome: chemical, physical, electrical, magnetic, optical, in-situ, and real-time control and monitoring. The conference summarizes major issues and provides critical reviews of important semiconductor techniques needed as the semiconductor industry continues its move to silicon nanoelectronics and beyond.
Proceedings Title
Frontiers of Characterization and Metrology for Nanoelectronics: 2017
Conference Dates
March 20-23, 2017
Conference Location
Monterey, CA
Conference Title
2017 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics

Citation

Secula, E. and Seiler, D. (2017), Frontiers of Characterization and Metrology for Nanoelectronics: 2017, Frontiers of Characterization and Metrology for Nanoelectronics: 2017, Monterey, CA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=923057 (Accessed July 6, 2022)
Created March 20, 2017, Updated June 27, 2019