Allen, R.
and Cresswell, M.
(1992),
Elimination of Effects Due to Patterning Imperfections in Electrical Test Structures for Submicrometer Feature Metrology, Solid-State Electronics
(Accessed May 4, 2025)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Elimination of Effects Due to Patterning Imperfections in Electrical Test Structures for Submicrometer Feature Metrology
Published
Author(s)
,
Citation
Solid-State Electronics
Volume
35
Issue
3
Pub Type
Journals
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created December 30, 1992, Updated October 12, 2021