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Chemical Analysis of HfO22/ Si (100) Film Systems Exposed to NH3 Thermal Processing

Published

Author(s)

Patrick S. Lysaght, Joseph Woicik, Daniel A. Fischer, G K. Bersuker, Joel Barnett, Brendan Foran, H . Tseng, Raj Jammy
Citation
Journal of Applied Physics
Volume
101
Issue
2

Citation

Lysaght, P. , Woicik, J. , Fischer, D. , Bersuker, G. , Barnett, J. , Foran, B. , Tseng, H. and Jammy, R. (2007), Chemical Analysis of HfO22/ Si (100) Film Systems Exposed to NH3 Thermal Processing, Journal of Applied Physics, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=854228 (Accessed April 16, 2024)
Created January 14, 2007, Updated October 12, 2021