NOTICE: Due to a lapse in annual appropriations, most of this website is not being updated. Learn more.

Form submissions will still be accepted but will not receive responses at this time. Sections of this site for programs using non-appropriated funds (such as NVLAP) or those that are excepted from the shutdown (such as CHIPS and NVD) will continue to be updated.

U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

PUBLICATIONS

Chemical Analysis of HfO22/ Si (100) Film Systems Exposed to NH3 Thermal Processing

Published

Author(s)

Patrick S. Lysaght, Joseph Woicik, Daniel A. Fischer, G K. Bersuker, Joel Barnett, Brendan Foran, H . Tseng, Raj Jammy
Citation
Journal of Applied Physics
Volume
101
Issue
2
Pub Type
Journals

Download Paper

Local Download
Materials

Citation

Lysaght, P. , Woicik, J. , Fischer, D. , Bersuker, G. , Barnett, J. , Foran, B. , Tseng, H. and Jammy, R. (2007), Chemical Analysis of HfO22/ Si (100) Film Systems Exposed to NH3 Thermal Processing, Journal of Applied Physics, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=854228 (Accessed October 10, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact [email protected].

Created January 14, 2007, Updated October 12, 2021
Was this page helpful?