Lysaght, P.
, Woicik, J.
, Fischer, D.
, Bersuker, G.
, Barnett, J.
, Foran, B.
, Tseng, H.
and Jammy, R.
(2007),
Chemical Analysis of HfO22/ Si (100) Film Systems Exposed to NH3 Thermal Processing, Journal of Applied Physics, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=854228
(Accessed December 10, 2024)
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Chemical Analysis of HfO22/ Si (100) Film Systems Exposed to NH3 Thermal Processing
Published
Author(s)
Patrick S. Lysaght, , , G K. Bersuker, Joel Barnett, Brendan Foran, H . Tseng, Raj Jammy
Citation
Journal of Applied Physics
Volume
101
Issue
2
Pub Type
Journals
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If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created January 14, 2007, Updated October 12, 2021