TY  - JOUR
AU  - Patrick Lysaght
AU  - Joseph Woicik
AU  - Daniel Fischer
AU  - G Bersuker
AU  - Joel Barnett
AU  - Brendan Foran
AU  - H Tseng
AU  - Raj Jammy
C2  - Journal of Applied Physics
DA  - 2007-01-15 00:01:00
LA  - en
M1  - 101
PB  - Journal of Applied Physics
PY  - 2007
TI  - Chemical Analysis of HfO22/ Si (100) Film Systems Exposed to NH3 Thermal Processing
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=854228
ER  -