@article{837081,
  author = {Patrick Lysaght and Joseph Woicik and Daniel Fischer and G Bersuker and Joel Barnett and Brendan Foran and H Tseng and Raj Jammy},
  title = {Chemical Analysis of HfO22/ Si (100) Film Systems Exposed to NH3 Thermal Processing},
  year = {2007},
  number = {101},
  month = {2007-01-15 00:01:00},
  publisher = {Journal of Applied Physics},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=854228},
  language = {en},
}