Postek, M.
, Larrabee, R.
and Keery, W.
(1989),
An Approach to Accurate X-Ray Mask Measurements in a Scanning Electron Microscope, NIST Interagency/Internal Report (NISTIR), National Institute of Standards and Technology, Gaithersburg, MD
(Accessed September 8, 2024)
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An Approach to Accurate X-Ray Mask Measurements in a Scanning Electron Microscope
Published
Author(s)
, ,
Citation
NIST Interagency/Internal Report (NISTIR) -
Volume
89
Issue
4047
NIST Pub Series
Pub Type
NIST Pubs
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created December 31, 1988, Updated October 12, 2021