Wen-Li Wu

Dr. Wu's primary field of scientific expertise is the development of advanced x‑ray/neutron scattering methods and their applications to investigations of the structure and properties of polymeric materials in thin films and at interfaces.

Awards and Honors

Department of Commerce Bronze Medal (1984)
Department of Commerce Silver Medal (1989)
Department of Commerce Gold Medal (1992)
Fellow of the American Physical Society (1992)
Samuel Wesley Stratton Award (1997)
William P. Slichter Award (2001 & 2007)
Adjunct Professor, Composite Research Center, University of Delaware (1992 - present)
Advisory Board Member, Center on Polymer Interfaces and Macromolecular Assemblies, Stanford University (1997 - present)
NIST Fellow (2004-present)
PMSE Fellow, American Chemical Society (2006)
Fellow, Neutron Scattering Society of America (2010)
ACS National Award for Team Innovation (2019)

Selected Publications

Thermodynamic Interactions in Double-Network Hydrogels

March 11, 2008

Author(s)

Taiki Tominaga, Vijay Tirumala, Sanghun Lee, Eric K. Lin, Jian P. Gong, Wen-Li Wu

Double-network hydrogels (DN-gels) prepared from the combination of a moderately crosslinked anionic polyelectrolyte and an uncrosslinked linear polymer

Direct Measurement of the Reaction Front in Chemically Amplified Photoresists

July 1, 2002

Author(s)

Eric K. Lin, Sushil K. Satija, Wen-Li Wu, Christopher L. Soles, D L. Goldfarb, B C. Trinque, S D. Burns, Ronald L. Jones, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, M Angelopoulos, C G. Willson

The continuing drive by the semiconductor industry to fabricate smaller structures with photolithography will soon require dimensional control at length scales

Dependance of the Glass Transition Temperature of Polymer Films on Interfacial Energy and Thickness

July 1, 2001

Author(s)

D S. Fryer, R D. Peters, E J. Kim, J E. Tomaszewski, J J. Pablo, P E. Nealey, Christopher C. White, Wen-Li Wu

The glass transition temperature (Tg) of ultra thin films (thickness 80-18mm) of polystyrene (PS) and poly (methyl methacrylate) (PMMA) was measured on surfaces

Publications

The Pore Structure and Its Impacts on Property and Performance of a Spin-on Porous Low k Dielectric

October 12, 2021

Author(s)

Yiping Liu, Wen-Li Wu, B J. Foran, D Gidley, Hae-Jeong Lee, Barry J. Bauer, B D. Vogt

A methylsilsesquioxane based porous spin-on dielectric has been evaluated at International SEMETCH (ISMT) for advanced interconnect applications. The pore

Determination of the Complex Modulus of a Supported Ultra-Thin Polymer Film

October 12, 2021

Author(s)

Christopher C. White, Wen-Li Wu

A novel technique to quantitatively measure the complex modulus of ultra-thin polymer films (sub micron) is described. This technique employs a new mechanical

Chemically Amplified Photoresists Fundamental Properties and Limits of Applicability to Sub-100 nm Lithography

October 12, 2021

Author(s)

D M. Goldfarb, Eric K. Lin, Christopher Soles, B C. Trinque, S D. Burns, Ronald L. Jones, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, M Angelopoulos, C G. Wilson, Sushil K. Satija, Wen-Li Wu

State-of-the-art lithographic technologies combine chemically amplified photoresists and sophisticated radiation sources to delineate patterned areas with high

Understanding Deviations in Lithographic Patterns Near Interfaces: Characterization of Antireflective Coatings (ARC) and the ARC/Resist Interface

October 12, 2021

Author(s)

Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Daniel A. Fischer, S Sambasivan, Eric K. Lin, Wen-Li Wu, Douglas Guerrero, Yijun Wang, R Puligadda

Interactions between a bottom anti-reflective coating (BARC) and a photo-resist can critically impact lithographic patterns. For example, a lithographic pattern

Additive-Containing Rinses for LER and Defectivity Control During High-Resolution Resist Patterning

October 12, 2021

Author(s)

D L. Goldfarb, S D. Burns, M Angelopolous, S Skordas, R L. Burns, M C. Lawson, C J. Brodsky, V Vishnu, E Jablonski, Vivek Prabhu, Ronald L. Jones, B D. Vogt, Christopher Soles, Eric K. Lin, Wen-Li Wu

The addition of a surface conditioning agent to the de-ionized water rinse used to quench the photoresist development process is an attractive methodology that

View more Publications

Patents (2018-Present)

Determining Tilt Angle In Patterned Arrays Of High Aspect-Ratio Structures By Small-Angle X-Ray Scattering

NIST Inventors

Wen-Li Wu , Daniel Sunday and R Joseph Kline

Provided herein are methods and apparatus for characterizing high aspect ratio (HAR) structures of fabricated or partially fabricated semiconductor devices. The methods involve using small angle X-ray scattering (SAXS) to determine average parameters of an array of HAR structures. In some

Electron Reflectometer and Process for Performing Shape Metrology

NIST Inventors

Wen-Li Wu

An electron reflectometer includes: a sample stage; a source that produces source electrons; a source collimator; and an electron detector that receives collimated reflected electrons.

View All Patents

Wen-Li Wu (Assoc)

Awards and Honors

Selected Publications

Publications

Patents (2018-Present)