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https://www.nist.gov/people/wen-li-wu
Wen-Li Wu (Assoc)
Dr. Wu's primary field of scientific expertise is the development of advanced x‑ray/neutron scattering methods and their applications to investigations of the structure and properties of polymeric materials in thin films and at interfaces.
Awards and Honors
Department of Commerce Bronze Medal (1984)
Department of Commerce Silver Medal (1989)
Department of Commerce Gold Medal (1992)
Fellow of the American Physical Society (1992)
Samuel Wesley Stratton Award (1997)
William P. Slichter Award (2001 & 2007)
Adjunct Professor, Composite Research Center, University of Delaware (1992 - present)
Advisory Board Member, Center on Polymer Interfaces and Macromolecular Assemblies, Stanford University (1997 - present)
NIST Fellow (2004-present)
PMSE Fellow, American Chemical Society (2006)
Fellow, Neutron Scattering Society of America (2010)
Q Lin, Stephen Cohen, Lynne Gignac, Brian Herbst, David Klaus, Eva Simonyi, Jeffrey Hedrick, John Warlaumont, Hae-Jeong Lee, Wen-Li Wu
Low dielectric constant (low-k) nanocomposite thin films have been prepared by spin coating and thermal cure of solution mixtures of two organic low-k thermoset
Yiping Liu, Wen-Li Wu, B J. Foran, D Gidley, Hae-Jeong Lee, Barry J. Bauer, B D. Vogt
A methylsilsesquioxane based porous spin-on dielectric has been evaluated at International SEMETCH (ISMT) for advanced interconnect applications. The pore
A novel technique to quantitatively measure the complex modulus of ultra-thin polymer films (sub micron) is described. This technique employs a new mechanical
D M. Goldfarb, Eric K. Lin, Christopher Soles, B C. Trinque, S D. Burns, Ronald L. Jones, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, M Angelopoulos, C G. Wilson, Sushil K. Satija, Wen-Li Wu
State-of-the-art lithographic technologies combine chemically amplified photoresists and sophisticated radiation sources to delineate patterned areas with high
Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Daniel A. Fischer, S Sambasivan, Eric K. Lin, Wen-Li Wu, Douglas Guerrero, Yijun Wang, R Puligadda
Interactions between a bottom anti-reflective coating (BARC) and a photo-resist can critically impact lithographic patterns. For example, a lithographic pattern
patent description The proposed invention utilizes an X-ray source, X-ray detector, goniometer, and an X ray scattering pattern to determine the average tilt (direction and magnitude) in patterned and etched arrays of high aspect ratio (HAR) structures (>20:1) being developed for next generation
Patent Description It has been discovered that an electron reflectometer and process for performing shape metrology provide electron reflectometry (ER) for measurement or determination of nanoscale dimensions in three dimensions at a surface with small-angle electron reflection. According to Fresnel