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Wen-Li Wu (Assoc)

Dr. Wu's primary field of scientific expertise is the development of advanced x‑ray/neutron scattering methods and their applications to investigations of the structure and properties of polymeric materials in thin films and at interfaces.

Awards and Honors

  • Department of Commerce Bronze Medal (1984)
  • Department of Commerce Silver Medal (1989)
  • Department of Commerce Gold Medal (1992)
  • Fellow of the American Physical Society (1992)
  • Samuel Wesley Stratton Award (1997)
  • William P. Slichter Award (2001 & 2007)
  • Adjunct Professor, Composite Research Center, University of Delaware (1992 - present)
  • Advisory Board Member, Center on Polymer Interfaces and Macromolecular Assemblies, Stanford University (1997 - present)
  • NIST Fellow (2004-present)
  • PMSE Fellow, American Chemical Society (2006)
  • Fellow, Neutron Scattering Society of America (2010)
  • ACS National Award for Team Innovation (2019)

Publications

Chemically Amplified Photoresists Fundamental Properties and Limits of Applicability to Sub-100 nm Lithography

Author(s)
D M. Goldfarb, Eric K. Lin, Christopher Soles, B C. Trinque, S D. Burns, Ronald L. Jones, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, M Angelopoulos, C G. Wilson, Sushil K. Satija, Wen-Li Wu
State-of-the-art lithographic technologies combine chemically amplified photoresists and sophisticated radiation sources to delineate patterned areas with high

Patents

Presentation of technologies with similar applications as Electron Relectometry

Electron Reflectometer and Process for Performing Shape Metrology

NIST Inventors
Lawrence Henry Friedman and Wen-Li Wu
Patent Description It has been discovered that an electron reflectometer and process for performing shape metrology provide electron reflectometry (ER) for measurement or determination of nanoscale dimensions in three dimensions at a surface with small-angle electron reflection. According to Fresnel
Created October 9, 2019, Updated June 15, 2021