Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Chris A. Michaels (Fed)

Supervisory Research Chemist

ORCID: 0000-0002-6562-4848 (https://orcid.org/0000-0002-6562-4848)

ResearcherID: AAU-4817-2020 (https://publons.com/researcher/AAU-4817-2020/)

Chris A. Michaels received his Ph.D. in physical chemistry at Columbia University in 1997, working under Professor G.W. Flynn. He came to NIST as an NRC postdoctoral research fellow in 1997 and joined the staff as a Research Chemist in 1999. During his tenure at NIST he has been involved in the development of new techniques for high spatial resolution compositional mapping, including IR near-field microscopy and IR and Raman microscopy using solid immersion optics. His current, collaborative research efforts are focused on the development of Raman imaging methods for the study of materials under mechanical stress. Notable among these efforts is the development of a Raman nanoindentation instrument that allows an in-situ probe of pressure induced phase transformations in materials. 

In 2020, he became the group leader of the Microscopy and Microanalysis Research Group (643.02). In 2022, he started as the lead for the division Climate Focus Area.   

Awards

Department of Commerce Bronze Medal, 2011

Gordon Award, Federation of Societies for Coatings Technology, 2006

Samuel Wesley Stratton Award, NIST, 2002

Chemical Science and Technology Laboratory Technical Achievement Award, NIST, 2001

Louis P. Hammett Award, Columbia University, 1996

Selected Publications

Surface Plasmon Polariton Raman Microscopy

Author(s)
Hae-Wook Yoo, Lee J. Richter, Hee-Tae Jung, Chris A. Michaels
We report surface plasmon polariton (SPP) mediated Raman microscopy on dielectric films in contact with a Ag layer at 785 nm with spatial resolution approaching

Publications

Created October 9, 2019, Updated May 1, 2023