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Bottom-up Gold Electrodeposition for High Aspect Ratio Features in Imaging Applications

Patent Number: 10,889,908

Problem

Image depicting Bottom-up Gold Electrodeposition for High Aspect

Gold filling by conventional electrodeposition processes will deposit substantially on the field around the features of interest. This results in extended post-deposition processing to remove the extra material, waste of deposited gold, and more rapid depletion of electrolyte.

Invention

A process for filling trenches with gold from the bottom, permitting seam-free and void-free filling. Leaves minimal undesired deposits, little waste, and a reduction in post-deposition processing time.

Potential Commercial Applications

  • X-ray interferometry
  • X-ray phase contrast imaging
  • X-ray wave-front-sensing
  • Optics characterization
  • Optics alignment
  • Focus characterization at X-ray free-electron lasers (XFELs)
  • Biomedicine
  • Materials Science
  • Security

Competitive Advantage

  • Minimal deposits on the field
  • Little waste of gold
  • Reduction in post-deposition processing time.
  • Void-free filled recessed feature with highly uniform filling profiles
Created June 17, 2025, Updated September 10, 2025
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