Dr. Moffat is with the Functional Nanostructured Materials group in the Material Measurement Laboratory at NIST. He began his research career as an undergraduate student working part time in the laboratory of Barry Lichter and William Flanagan at Vanderbilt University. After receiving his B.E. in 1982 and M.Sc. in 1984, he joined Ron Latanision’s group in the H.H. Uhlig Laboratory at MIT. In 1989, he received a Sc.D. degree for his work exploring the chemical passivity of chromium-based metallic glasses. This was followed by a two year stint as a postdoctoral associate in Allen Bard’s chemistry laboratory at the University of Texas, Austin studying the corrosion and passivation of metals using scanning tunneling microscopy. Since joining NIST in 1991, Dr. Moffat’s efforts have focused on the application of electroanalytical and surface science methods to understand the structure, composition, and electrochemical performance of thin films. Exploration into surfactant mediated electrochemical deposition of microelectronic interconnects and, more recently, electrocatalysts have been of particular interest. For his work on superconformal electrodeposition, he received NIST’s Samuel Wesley Stratton Award (2011), named after the first director of the Institute, the Research Award of the ECS Electrodeposition Division (2006) and the Gold Medal award of the United States Department of Commerce (2001). To date he has authored or co-authored more than 200 technical papers. He was elected a Fellow of the Electrochemical Society in 2009. Dr. Moffat is an active member of the Electrochemical Society, International Society of Electrochemistry, Materials Research Society and American Association for the Advancement of Science.
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