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The Role of Annealing Conditions on the Radiation Response of Backgate MOSFETs, Extended Abstract
Published
Author(s)
G. J. Campisi, Peter Roitman, G. J. Shontz
Proceedings Title
Proc., Third Workshop on Radiation-Induced and/or Process-Related Electrically Active Defects in Semiconductor-Insulator Systems
Conference Dates
September 10-13, 1991
Conference Location
Research Triangle Park, NC, USA
Pub Type
Conferences
Citation
Campisi, G.
, Roitman, P.
and Shontz, G.
(1991),
The Role of Annealing Conditions on the Radiation Response of Backgate MOSFETs, Extended Abstract, Proc., Third Workshop on Radiation-Induced and/or Process-Related Electrically Active Defects in Semiconductor-Insulator Systems, Research Triangle Park, NC, USA
(Accessed October 11, 2025)