Potzick, J.
(1989),
Automated Calibration of Optical Photomask Linewidth Standards at the National Institute of Standards and Technology, Proc. Intl. Soc. for Optical Engineering (SPIE), Integrated Circuit Metrology, Inspection, and Process Control III, Los Angeles, CA
(Accessed November 5, 2025)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Automated Calibration of Optical Photomask Linewidth Standards at the National Institute of Standards and Technology
Published
Author(s)
Proceedings Title
Proc. Intl. Soc. for Optical Engineering (SPIE), Integrated Circuit Metrology, Inspection, and Process Control III
Volume
1087
Conference Dates
February 27-28, 1989
Conference Location
Los Angeles, CA
Pub Type
Conferences
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact [email protected].
Created December 31, 1989, Updated February 17, 2017