NOTICE: Due to a lapse in annual appropriations, most of this website is not being updated. Learn more.
Form submissions will still be accepted but will not receive responses at this time. Sections of this site for programs using non-appropriated funds (such as NVLAP) or those that are excepted from the shutdown (such as CHIPS and NVD) will continue to be updated.
An official website of the United States government
Here’s how you know
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
3D X-ray Metrology for Block Copolymer Lithography Line-Space Patterns
Published
Author(s)
Daniel F. Sunday, Matthew R. Hammond, Chengqing C. Wang, Wen-Li Wu, Regis J. Kline, Gila E. Stein
Abstract
We report on the development of a new measurement method, resonant critical-dimension small-angle x-ray scattering (CD-SAXS), for the characterization of the buried structure of block copolymers (BCP) used in directed self assembly (DSA). We use resonant scattering at the carbon edge to enhance the contrast between the two polymer blocks and allow the determination of the 3D shape of the native lamella in a line-space pattern. We demonstrate the method by comparing the results from conventional CD-SAXS to resonant CD-SAXS on a 1:1 DSA-BCP sample with a nominal 50 nm pitch. The resonant CD-SAXS method provides substantially improved uncertainty in the fit of the line shape and allows the determination of the buried structure.
Sunday, D.
, Hammond, M.
, Wang, C.
, Wu, W.
, Kline, R.
and Stein, G.
(2013),
3D X-ray Metrology for Block Copolymer Lithography Line-Space Patterns, Journal of Micro/Nanolithography, MEMS, and MOEMS
(Accessed October 1, 2025)