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PUBLICATIONS

UV/Ozone treatment to reduce metal-graphene contact resistance

Published

Author(s)

Wei Li, Kurt Pernstich, Angela R. Hight Walker, Tian T. Shen, Guangjun Cheng, Christina A. Hacker, Curt A. Richter, Qiliang Li, David J. Gundlach, Xuelei Liang, Lianmao Peng, Yiran Liang
Citation
Applied Physics Letters
Pub Type
Journals

Download Paper

Local Download
Semiconductors

Citation

Li, W. , Pernstich, K. , Hight, A. , Shen, T. , Cheng, G. , Hacker, C. , Richter, C. , Li, Q. , Gundlach, D. , Liang, X. , Peng, L. and Liang, Y. (2013), UV/Ozone treatment to reduce metal-graphene contact resistance, Applied Physics Letters, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=912639 (Accessed October 12, 2025)

Issues

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Created May 8, 2013, Updated February 19, 2017
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