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A scatterfield microscope for deep sub-wavelength semiconductor metrology using 193 nm light has been designed. In addition to accommodating the fixed numerical aperture and size of its commercial catadioptric objective lens, the illumination optics are formed to implement essential parameters necessary for angular illumination control at the sample plane. This angle-resolved scatterfield microscope requires access to a relatively large (> 10 mm) conjugate back focal plane as well as increased fluence from the ArF excimer laser source. The parametric optimization process yielded a telecentric conjugate back focal plane with appropriate numerical aperture and diameter by adjustment of the parameters of two interrelated lens groups.