Skip to main content

NOTICE: Due to a lapse in annual appropriations, most of this website is not being updated. Learn more.

Form submissions will still be accepted but will not receive responses at this time. Sections of this site for programs using non-appropriated funds (such as NVLAP) or those that are excepted from the shutdown (such as CHIPS and NVD) will continue to be updated.

U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Hunting the Origins of Line Width Roughness with Chemical Force Microscopy

Published

Author(s)

John T. Woodward IV, Jeeseong Hwang, V A. Prabhu
Proceedings Title
2007 Int. Conference, on the Frontiers of Characterization and Metrology for Nanoelectronics
Conference Dates
March 27-29, 2007
Conference Location
Gaithersburg, MD
Conference Title
Proc. of the 2007 Int. Conference, on the Frontiers of Characterization and Metrology for Nanoelectronics, AIP Conf. Vol. 931

Citation

Woodward, J. , Hwang, J. and Prabhu, V. (2007), Hunting the Origins of Line Width Roughness with Chemical Force Microscopy, 2007 Int. Conference, on the Frontiers of Characterization and Metrology for Nanoelectronics , Gaithersburg, MD (Accessed October 9, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact [email protected].

Created January 1, 2007, Updated February 17, 2017
Was this page helpful?