Skip to main content
U.S. flag

An official website of the United States government

Dot gov

The .gov means it’s official.
Federal government websites often end in .gov or .mil. Before sharing sensitive information, make sure you’re on a federal government site.

Https

The site is secure.
The https:// ensures that you are connecting to the official website and that any information you provide is encrypted and transmitted securely.

NanoFab Tool: Nanonex NX-2000 Nanoimprint Lithography (NIL) System

Photograph of the Nanonex NX-2000 Nano-Imprint Lithography System.
Photograph of the Nanonex NX-2000 Nano-Imprint Lithography System.

The Nanonex NX-2000 Nanoimprinter provides users with the capability to replicate surface patterns with feature sizes down to 10 nm over large areas at a low cost. The tool supports both thermal and ultra-violet (UV) curing NIL processes. The NanoFab provides standard recipes for patterning various NIL resists on substrates ranging from 150 mm diameter wafers down to small pieces.

Specifications/Capabilities

  • Nitrogen cushion uniformly presses the mold and substrate together, ensuring uniform patterning.
  • Selectable imprint temperature range: 20 °C to 300 °C.
  • Capable of patterning both UV-curable and thermoplastic resists.
  • Minimum feature size: 10 nm.

Usage Information

Supported Sample Sizes

  • Maximum wafer diameter: 150 mm (6 in).
  • Small pieces supported: Yes.
  • Maximum substrate thickness: 5 mm.

Typical Applications

  • Polymer and sol-gel surface patterning.
  • Nanoscale device fabrication.
  • Studying polymer properties at the nanoscale.
Created May 7, 2014, Updated November 21, 2019