NanoFab Tool: Nanonex NX-2000 Nanoimprint Lithography (NIL) System
The Nanonex NX-2000 Nanoimprinter provides users with the capability to replicate surface patterns with feature sizes down to 10 nm over large areas at a low cost. The tool supports both thermal and ultra-violet (UV) curing NIL processes. The NanoFab provides standard recipes for patterning various NIL resists on substrates ranging from 150 mm diameter wafers down to small pieces.
Nitrogen cushion uniformly presses the mold and substrate together, ensuring uniform patterning.
Selectable imprint temperature range: 20 °C to 300 °C.
Capable of patterning both UV-curable and thermoplastic resists.