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NanoFab Tool: Nanonex NX-2000 Nanoimprint Lithography (NIL) System

Photograph of the Nanonex NX-2000 Nano-Imprint Lithography System.
Photograph of the Nanonex NX-2000 Nano-Imprint Lithography System.

The Nanonex NX-2000 Nanoimprinter provides users with the capability to replicate surface patterns with feature sizes down to 10 nm over large areas at a low cost. The tool supports both thermal and ultra-violet (UV) curing NIL processes. The NanoFab provides standard recipes for patterning various NIL resists on substrates ranging from 150 mm diameter wafers down to small pieces.


  • Nitrogen cushion uniformly presses the mold and substrate together, ensuring uniform patterning.
  • Selectable imprint temperature range: 20 °C to 300 °C.
  • Capable of patterning both UV-curable and thermoplastic resists.
  • Minimum feature size: 10 nm.

Usage Information

Supported Sample Sizes

  • Maximum wafer diameter: 150 mm (6 in).
  • Small pieces supported: Yes.
  • Maximum substrate thickness: 5 mm.

Typical Applications

  • Polymer and sol-gel surface patterning.
  • Nanoscale device fabrication.
  • Studying polymer properties at the nanoscale.
Created May 7, 2014, Updated November 21, 2019