NanoFab Tool: JEOL JBX 6300-FS Direct Write Electron Beam Lithography System (Cleanroom)
The JEOL JBX 6300-FS direct write electron beam lithography system allows users to quickly and directly pattern a variety of substrate materials with features down to 10 nm. The JBX 6300-FS offers a large 1 mm field size as well as the ability to write on curved substrates. The high precision stage provides excellent pattern stitching. The system's autoloader enables unattended batch processing and can accommodate substrates ranging from 200 mm diameter wafers down to small pieces.