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Metrology

Electrical / electromagnetic metrology

News and Updates

Projects and Programs

Measuring Intermolecular Interactions with Electro-Acoustic Spectroscopy

Ongoing
We have a number of opportunities to collaborate with us. See below for details. What does this project aim to do for the chemical industry? Many industrial processes depend on the intermolecular environment- the solvents and ions that surround a molecule. These interactions impact separations
Small array of transistors designed for single device integration.

Integrated CMOS Testbeds for Nanoelectronics and Machine Learning

Ongoing
The increasingly complex device requirements for next-generation computing architectures such as neuromorphic computing or nanoelectronic machine learning accelerators present challenges for researchers across the spectrum of institutions, from small businesses and universities to government
A 3" wafer is seen concentric with the lower plasma electrode.

Precision Materials for Quantum Devices

Ongoing
MBE System Our fabrication system is composed of ultra-high vacuum (UHV) chambers that support the in-vacuum exchange of 75 mm wafers without exposure to air as seen in Figure 1. These chambers are: (1) a deposition chamber with electron gun deposition, UHV compatible sputter guns, in situ shadow

Publications

Statistical study and parallelization of multiplexed single-electron sources

Author(s)
S Norimoto, P See, N Schoinas, I Rungger, Tommy Boykin, Michael Stewart, J. P. Griffiths, C. Chen, D. A. Ritchie, M. Kataoka
Increasing electric current from a single-electron source is a main challenge in an effort to establish the standard of the ampere defined by the fixed value of

The Quantum Electro-Mechanical Metrology Suite

Author(s)
Frank Seifert, Lorenz Keck, David B. Newell, Darine El Haddad
The National Institute of Standards and Technology (NIST) is building a robust open-source hardware and software Quantum Electro-Mechanical Metrology Suite

Tools and Instruments

MBE Facility

Molecular Beam Epitaxy (MBE) Facility

The Applied Physics Division utilizes a fully automated, dual-chamber molecular beam epitaxy (MBE) system for the growth of advanced, compound semiconductor