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The NIST Industrial Wireless Systems project, led by Rick Candell, is driving innovation in wireless technologies to meet the critical demands of industrial
Increasing digitalization brings new opportunities and challenges to standards development. This project supports the future of standards development through
This project develops scalable bioprocess models for controlled cell culture expansion, integrating real-time data collection and digital modeling to improve
In response to worldwide initiatives to phase down working fluids that have a high index for trapping of infrared radiation and may be affected by future
Quantitative chemical imaging of live cells is a long-standing measurement goal in cell-based sciences and industries. Infrared (IR) transmission microscopy is
The Oxford Silicon PlasmaPro 100 Cobra etcher is a fluorocarbon based plasma etch system that provides users anisotropic etching of silicon at room and low
The Oxford Metal PlasmaPro 100 Cobra etcher is a chlorine-based plasma etch system that provides users with selective etching of metals. The tool is equipped