April 5, 1999
Author(s)
H. R. Huff, Curt A. Richter, M. L. Green, G. Lucovsky
This Materials research society Proceedings contains 81 papers presented at the Ultrathin SiO 2 and High-K Materials for gate Dielectrics Symposium, held April 5-9, 1999, in San Francisco. The symposium was truly international with 34 of the 81 published