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X-Ray Metrology by Diffraction and Reflectivity

Published

Author(s)

D K. Bowen, R Deslattes

Abstract

X-ray methods can provide measurements that, for certain parameters of great technological importance, are the most accurate and sensitive available. Their importance is likely to grow as layer thicknesses shrink, and as novel materials such as porous dielectrics come into production.
Proceedings Title
Characterization and Metrology for ULSI Technology 2000, International Conference | | Characterization and Metrology for ULSI Technology |AIP
Volume
No. 550
Conference Dates
June 26-29, 2000
Conference Location
Undefined
Conference Title
AIP Conference Proceedings

Keywords

high resolution x-ray diffraction, thin films, x-ray metrology, x-ray reflectivity

Citation

Bowen, D. and Deslattes, R. (2001), X-Ray Metrology by Diffraction and Reflectivity, Characterization and Metrology for ULSI Technology 2000, International Conference | | Characterization and Metrology for ULSI Technology |AIP, Undefined (Accessed April 23, 2024)
Created May 31, 2001, Updated October 12, 2021