Yu, L.
, Cheung, K.
, Tilak, V.
, Dunne, G.
, Matocha, K.
, Campbell, J.
, Suehle, J.
and Sheng, K.
(2009),
Wafer-level Hall Measurement on SiC MOSFET, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=907098
(Accessed April 19, 2024)
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Wafer-level Hall Measurement on SiC MOSFET
Published
Author(s)
, , Vinayak Tilak, Greg Dunne, Kevin Matocha, , , Kuang Sheng
Abstract
Low channel mobility is one of the biggest challenges to commercializing SiC MOSFETs. Accurate mobility measurement is essential for understanding the mechanisms that lead to low mobility. The most widely used effective mobility measurements overestimate the inversion charge for devices that have high level of defects. Mobility measured by the Hall effect is more accurate; however the conventional Hall mobility measurement is tedious. In this work, we demonstrate a wafer-level Hall measurement technique, which is simple and convenient to implement. With this method, extensive study of the mobility degradation is possible.Pub Type
Talks
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Keywords
MOSFET, channel mobility, Hall mobility
Citation
Created October 16, 2009, Updated February 19, 2017