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UV Radiometry Issues for UV Stabilization of Photoresist

Published

Author(s)

J Shi, S Grindle, S Chen, G Owen, L Insalaco, C L. Cromer, Lori S. Goldner
Citation
Proc SPIE's 1995 International Symposium on Microlithography
Volume
2440

Citation

Shi, J. , Grindle, S. , Chen, S. , Owen, G. , Insalaco, L. , Cromer, C. and Goldner, L. (1995), UV Radiometry Issues for UV Stabilization of Photoresist, Proc SPIE's 1995 International Symposium on Microlithography (Accessed April 19, 2024)
Created December 31, 1994, Updated October 12, 2021