Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Time Dependent Breakdown of Ultra-Thin Gate Dielectrics Under Pulsed Biased Stress



Bin Wang, John S. Suehle, Eric M. Vogel, J B. Bernstein


Ultra-thin SiO2 films (tox 2.0 nm) were stressed under DC, unipolar, and bipolar pulsed bias conditions up to a pulse repetition frequency of 50 kHz. The time-to-breakdown (tBD), the number of defects at breakdown (N^dBD), and the number of defects generated inside the oxide as a function of stress time were monitored during each stress dondition. Oxide lifetime under unipolar pulsed bias is similar to that under DC conditions; however lifetime under bipolar pulsed bias is significantly improved and exhibits a dependence on pulse repetition frequency. The observation of a lifetime increase under bipolar pulsed bias for the oxide thickness and voltage range used in this study suggests that a different physical mechanism may be responsible for the lifetime increase from that assumed in earlier studies for thicker films.
IEEE Electron Device Letters


dielectric breakdown, reliability, silicone dioxide, ultra-thin gate dielectric


Wang, B. , Suehle, J. , Vogel, E. and Bernstein, J. (2001), Time Dependent Breakdown of Ultra-Thin Gate Dielectrics Under Pulsed Biased Stress, IEEE Electron Device Letters (Accessed December 2, 2023)
Created February 28, 2001, Updated October 12, 2021