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Time Dependent Breakdown of Ultra-Thin Gate Dielectrics Under Pulsed Biased Stress



Bin Wang, John S. Suehle, Eric M. Vogel, J B. Bernstein


Ultra-thin SiO2 films (tox 2.0 nm) were stressed under DC, unipolar, and bipolar pulsed bias conditions up to a pulse repetition frequency of 50 kHz. The time-to-breakdown (tBD), the number of defects at breakdown (N^dBD), and the number of defects generated inside the oxide as a function of stress time were monitored during each stress dondition. Oxide lifetime under unipolar pulsed bias is similar to that under DC conditions; however lifetime under bipolar pulsed bias is significantly improved and exhibits a dependence on pulse repetition frequency. The observation of a lifetime increase under bipolar pulsed bias for the oxide thickness and voltage range used in this study suggests that a different physical mechanism may be responsible for the lifetime increase from that assumed in earlier studies for thicker films.
IEEE Electron Device Letters


dielectric breakdown, reliability, silicone dioxide, ultra-thin gate dielectric


Wang, B. , Suehle, J. , Vogel, E. and Bernstein, J. (2001), Time Dependent Breakdown of Ultra-Thin Gate Dielectrics Under Pulsed Biased Stress, IEEE Electron Device Letters (Accessed June 23, 2024)


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Created February 28, 2001, Updated October 12, 2021