Rocas, E.
, Collado, J.
, Mateu, J.
, Orloff, N.
, Padilla, A.
, Callaghan, J.
, Booth, J.
and Aigner, R.
(2008),
Third order Intermodulation Distortion in Film Bulk Acoustic Resonators at Resonance and Antiresonance, IEEE Transactions on Ultrasonics Ferroelectrics and Frequency Control, [online], https://doi.org/10.1109/MWSYM.2008.4633288
(Accessed October 17, 2025)
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Third order Intermodulation Distortion in Film Bulk Acoustic Resonators at Resonance and Antiresonance
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Author(s)
, , , , Alberto Padilla, Juan Callaghan, , Robert Aigner
Abstract
This paper presents recent measurements and modeling of the third order intermodulation products of a Film Bulk Acoustic Resonator (FBAR), for a various values of frequency spacing between driving tones. The frequency dependence of voltage and current in the acoustic branch rules out a voltage-dependent nonlinearity. The results show different slopes at resonance and antiresonance, which are correctly adjusted by the model with a current dependent inductor and/or capacitor. The intermodulation distortion is found to be dependent on the frequency spacing between driving tones, indicating memory effects.Citation
IEEE Transactions on Ultrasonics Ferroelectrics and Frequency Control
Pub Type
Journals
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Keywords
Thin-film bulk acoustic wave resonators, intermodulation, nonlinear characterization, resonance, antiresonance.
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Created June 15, 2008, Updated January 27, 2020