NOTICE: Due to a lapse in annual appropriations, most of this website is not being updated. Learn more.

Form submissions will still be accepted but will not receive responses at this time. Sections of this site for programs using non-appropriated funds (such as NVLAP) or those that are excepted from the shutdown (such as CHIPS and NVD) will continue to be updated.

U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

PUBLICATIONS

Thickness Determination of Ultra-Thin SiO2 Films on Si by Spectroscopic Ellipsometry

Published

Author(s)

Nhan Van Nguyen, Curt A. Richter
Proceedings Title
Proc., ECS Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films
Volume
97-10
Conference Dates
May 4-9, 1997
Conference Location
Montreal, 1, CA
Pub Type
Conferences

Citation

Nguyen, N. and Richter, C. (1997), Thickness Determination of Ultra-Thin SiO<sub>2</sub> Films on Si by Spectroscopic Ellipsometry, Proc., ECS Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films, Montreal, 1, CA (Accessed October 21, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact [email protected].

Created December 30, 1997, Updated October 12, 2021
Was this page helpful?