Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

TDDB Characterization of Thin SiO2 Films With Bimodal Failure Populations

Published

Author(s)

J. Prendergast, John S. Suehle, P Chaparala, E. Murphy, M. Stephenson
Proceedings Title
Proc., 1995 International Reliability Physics Symposium
Conference Dates
April 3-6, 1995
Conference Location
Las Vegas, NV, USA

Citation

Prendergast, J. , Suehle, J. , Chaparala, P. , Murphy, E. and Stephenson, M. (1995), TDDB Characterization of Thin SiO<sub>2</sub> Films With Bimodal Failure Populations, Proc., 1995 International Reliability Physics Symposium, Las Vegas, NV, USA (Accessed July 14, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created December 30, 1995, Updated October 12, 2021