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TDDB Characterization of Thin SiO2 Films With Bimodal Failure Populations



J. Prendergast, John S. Suehle, P Chaparala, E. Murphy, M. Stephenson
Proceedings Title
Proc., 1995 International Reliability Physics Symposium
Conference Dates
April 3-6, 1995
Conference Location
Las Vegas, NV, USA


Prendergast, J. , Suehle, J. , Chaparala, P. , Murphy, E. and Stephenson, M. (1995), TDDB Characterization of Thin SiO<sub>2</sub> Films With Bimodal Failure Populations, Proc., 1995 International Reliability Physics Symposium, Las Vegas, NV, USA (Accessed July 14, 2024)


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Created December 30, 1995, Updated October 12, 2021