Benck, E.
, Golubiatnikow, G.
, Fraser, G.
, Ji, B.
, Motika, S.
and Karwacki, E.
(2003),
Submillimeter-Wavelength Plasma Chemical Diagnostics for Semiconductor Manufacturing, Journal of Vacuum Science and Technology B
(Accessed December 9, 2024)
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Submillimeter-Wavelength Plasma Chemical Diagnostics for Semiconductor Manufacturing
Published
Author(s)
, G Y. Golubiatnikow, , B Ji, S A. Motika, E J. Karwacki
Abstract
Submillimeter-wavelength, linear-absorption spectroscopy has been applied to the chemical diagnostics of a reactive-ion etching plasma in a modified capacitively coupled Gaseous Electronics Conference (GEC) reactor. Approximately 1 mW of narrow-band (Citation
Journal of Vacuum Science and Technology B
Volume
21
Issue
No. 5
Pub Type
Journals
Keywords
absorption spectroscopy, backward-wave oscillator, plasma diagnostic, submillimeter-wavelength
Citation
Issues
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Created September 1, 2003, Updated February 17, 2017