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Submillimeter-Wavelength Plasma Chemical Diagnostics for Semiconductor Manufacturing

Published

Author(s)

Eric C. Benck, G Y. Golubiatnikow, Gerald T. Fraser, B Ji, S A. Motika, E J. Karwacki

Abstract

Submillimeter-wavelength, linear-absorption spectroscopy has been applied to the chemical diagnostics of a reactive-ion etching plasma in a modified capacitively coupled Gaseous Electronics Conference (GEC) reactor. Approximately 1 mW of narrow-band (
Citation
Journal of Vacuum Science and Technology B
Volume
21
Issue
No. 5

Keywords

absorption spectroscopy, backward-wave oscillator, plasma diagnostic, submillimeter-wavelength

Citation

Benck, E. , Golubiatnikow, G. , Fraser, G. , Ji, B. , Motika, S. and Karwacki, E. (2003), Submillimeter-Wavelength Plasma Chemical Diagnostics for Semiconductor Manufacturing, Journal of Vacuum Science and Technology B (Accessed August 9, 2022)
Created September 1, 2003, Updated February 17, 2017