Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Standards, Metrology and Technology to Minimize Healthcare-Associated Infections: Novel approaches to measure efficacy

Published

Author(s)

Brian J. Nablo, Darwin Reyes-Hernandez, Dianne L. Poster, Michael T. Postek, Yaw S. Obeng

Abstract

Healthcare-associated infections (HAIs) impose great burdens on public health, making HAIs the strongest contender as the most pressing healthcare problem in acute-care hospitalization. Ultraviolet-C illumination effectively decontaminate surfaces to reduce the population of many HAI-inducing microbes. Unfortunately, no industry-accepted standards exist for evaluating the decontamination efficacy, largely due to a paucity of measurements. Ideally, technology to detect microbial populations on surfaces will be sensitive, rapid, and efficient to maintain the high turnover required by hospitals. In this paper, we discuss some recent advances in UV- antimicrobial metrology focused on underpinning the development of standards through a collaborative effort involving NIST, the ultraviolet industry and the Yale School of Medicine.
Proceedings Title
Workshop on Ultraviolet Disinfection Technologies & Healthcare Associated Infections: Defining
Standards and Metrology Needs
Conference Dates
January 14-15, 2020
Conference Location
Gaithersburg, MD, US

Keywords

microwaves, cell integrity, DNA, metrology, standards

Citation

Nablo, B. , Reyes-Hernandez, D. , Poster, D. , Postek, M. and Obeng, Y. (2020), Standards, Metrology and Technology to Minimize Healthcare-Associated Infections: Novel approaches to measure efficacy, Workshop on Ultraviolet Disinfection Technologies & Healthcare Associated Infections: Defining Standards and Metrology Needs, Gaithersburg, MD, US, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=929469 (Accessed April 24, 2024)
Created January 13, 2020, Updated October 12, 2021