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Standard Reference Materials ::Certification of a standard reference material for the determination of interstitial oxygen concentration in semiconductor silicon by infrared spectrophotometry/

Published

Author(s)

Brian G Rennex
Citation
- NIST SP 260-121
Report Number
NIST SP 260-121

Citation

Rennex, B. (1994), Standard Reference Materials ::Certification of a standard reference material for the determination of interstitial oxygen concentration in semiconductor silicon by infrared spectrophotometry/, , National Institute of Standards and Technology, Gaithersburg, MD, [online], https://doi.org/10.6028/NIST.SP.260-121 (Accessed July 15, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created January 1, 1994, Updated May 20, 2023