Rennex, B.
(1994),
Standard Reference Materials ::Certification of a standard reference material for the determination of interstitial oxygen concentration in semiconductor silicon by infrared spectrophotometry/, , National Institute of Standards and Technology, Gaithersburg, MD, [online], https://doi.org/10.6028/NIST.SP.260-121
(Accessed March 24, 2025)
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Standard Reference Materials ::Certification of a standard reference material for the determination of interstitial oxygen concentration in semiconductor silicon by infrared spectrophotometry/
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- NIST SP 260-121
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NIST SP 260-121
Pub Type
NIST Pubs
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Created January 1, 1994, Updated May 20, 2023