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Spectroscopic Ellipsometry Characterization of High-K Dielectric HfO2 Thin Films and the High-Temperature Annealing on Their Optical Properties

Published

Author(s)

Yong J. Cho, Nhan Van Nguyen, Curt A. Richter, James R. Ehrstein, Byoung H. Lee, Jack C. Lee
Citation
Applied Physics Letters
Volume
80
Issue
7

Keywords

high-k, spectroscopic ellipsometry, thin films

Citation

Cho, Y. , Nguyen, N. , Richter, C. , Ehrstein, J. , Lee, B. and Lee, J. (2002), Spectroscopic Ellipsometry Characterization of High-K Dielectric HfO<sub>2</sub> Thin Films and the High-Temperature Annealing on Their Optical Properties, Applied Physics Letters (Accessed April 22, 2024)
Created February 17, 2002, Updated October 12, 2021