Cho, Y.
, Nguyen, N.
, Richter, C.
, Ehrstein, J.
, Lee, B.
and Lee, J.
(2002),
Spectroscopic Ellipsometry Characterization of High-K Dielectric HfO<sub>2</sub> Thin Films and the High-Temperature Annealing on Their Optical Properties, Applied Physics Letters
(Accessed December 8, 2024)
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Spectroscopic Ellipsometry Characterization of High-K Dielectric HfO2 Thin Films and the High-Temperature Annealing on Their Optical Properties
Published
Author(s)
, , , , Byoung H. Lee, Jack C. Lee
Citation
Applied Physics Letters
Volume
80
Issue
7
Pub Type
Journals
Keywords
high-k, spectroscopic ellipsometry, thin films
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created February 17, 2002, Updated October 12, 2021