Since 1995, the International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (formerly titled "Characterization and Metrology for ULSI Technology") has provided a forum for the characterization and metrology community to meet and discuss important breakthroughs and challenges that directly and indirectly affect manufacturing. The methods and techniques have included all approaches: chemical and physical, electrical, optical, in-situ, and real-time control and monitoring.
Citation: IEEE Transactions on Semiconductor Manufacturing
Pub Type: Journals
characterization, conference, metrology, nanoelectronics