Seiler, D.
(2006),
Special Section on the International Conference on Frontiers of Characterization and Metrology for Nanoelectronics, IEEE Transactions on Semiconductor Manufacturing, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=32443
(Accessed September 10, 2024)
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Special Section on the International Conference on Frontiers of Characterization and Metrology for Nanoelectronics
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Abstract
Since 1995, the International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (formerly titled "Characterization and Metrology for ULSI Technology") has provided a forum for the characterization and metrology community to meet and discuss important breakthroughs and challenges that directly and indirectly affect manufacturing. The methods and techniques have included all approaches: chemical and physical, electrical, optical, in-situ, and real-time control and monitoring.Citation
IEEE Transactions on Semiconductor Manufacturing
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Journals
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Keywords
characterization, conference, metrology, nanoelectronics
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Created November 1, 2006, Updated January 27, 2020