Seiler, D.
(2006),
Special Section on the International Conference on Frontiers of Characterization and Metrology for Nanoelectronics, IEEE Transactions on Semiconductor Manufacturing, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=32443
(Accessed April 20, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Special Section on the International Conference on Frontiers of Characterization and Metrology for Nanoelectronics
Published
Author(s)
Abstract
Since 1995, the International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (formerly titled "Characterization and Metrology for ULSI Technology") has provided a forum for the characterization and metrology community to meet and discuss important breakthroughs and challenges that directly and indirectly affect manufacturing. The methods and techniques have included all approaches: chemical and physical, electrical, optical, in-situ, and real-time control and monitoring.Citation
IEEE Transactions on Semiconductor Manufacturing
Pub Type
Journals
Download Paper
Keywords
characterization, conference, metrology, nanoelectronics
Citation
Created November 1, 2006, Updated January 27, 2020