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Special Section on the International Conference on Frontiers of Characterization and Metrology for Nanoelectronics

Published

Author(s)

David G. Seiler

Abstract

Since 1995, the International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (formerly titled "Characterization and Metrology for ULSI Technology") has provided a forum for the characterization and metrology community to meet and discuss important breakthroughs and challenges that directly and indirectly affect manufacturing. The methods and techniques have included all approaches: chemical and physical, electrical, optical, in-situ, and real-time control and monitoring.
Citation
IEEE Transactions on Semiconductor Manufacturing

Keywords

characterization, conference, metrology, nanoelectronics

Citation

Seiler, D. (2006), Special Section on the International Conference on Frontiers of Characterization and Metrology for Nanoelectronics, IEEE Transactions on Semiconductor Manufacturing, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=32443 (Accessed May 27, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created November 1, 2006, Updated January 27, 2020