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Semiconductor Measurement Technology: Automatic Determination of the Interstitial Oxygen Content of Silicon Wafers Polished on Both Sides

Published

Author(s)

W. K. Gladden, D. Baghdadi, S. Slaughter, William Duncan
Citation
Special Publication (NIST SP) -
Volume
400
Issue
81

Citation

Gladden, W. , Baghdadi, D. , Slaughter, S. and Duncan, W. (1988), Semiconductor Measurement Technology: Automatic Determination of the Interstitial Oxygen Content of Silicon Wafers Polished on Both Sides, Special Publication (NIST SP), National Institute of Standards and Technology, Gaithersburg, MD (Accessed July 19, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created November 30, 1988, Updated October 12, 2021