Gladden, W.
, Baghdadi, D.
, Slaughter, S.
and Duncan, W.
(1988),
Semiconductor Measurement Technology: Automatic Determination of the Interstitial Oxygen Content of Silicon Wafers Polished on Both Sides, Special Publication (NIST SP), National Institute of Standards and Technology, Gaithersburg, MD
(Accessed March 13, 2025)
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Semiconductor Measurement Technology: Automatic Determination of the Interstitial Oxygen Content of Silicon Wafers Polished on Both Sides
Published
Author(s)
W. K. Gladden, D. Baghdadi, S. Slaughter,
Citation
Special Publication (NIST SP) -
Volume
400
Issue
81
NIST Pub Series
Pub Type
NIST Pubs
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created November 30, 1988, Updated October 12, 2021