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Semiconductor Characterization and Analytical Technology

Published

Author(s)

Thomas J. Shaffner

Abstract

The utility of semiconductor characterization techniques continues to be measured by industry requirements for smaller device geometry, atomically smooth surfaces and interfaces, and increased material purity. Those techniques that specialize in the micropot and structural analysis of microcircuits are reviewed in this paper, with examples of applications to manufacturing and process development. Brief tutorials, case studies, and comparisons show how the strengths and weaknesses of each should be understood before selecting those methods most suitable for the problem at hand.
Citation
Proceedings of the IEEE
Volume
88
Issue
9

Keywords

characterization, analytical techniques, techniques review, characterization tutorial, technique comparisons, microscopy, thin film, microspot, SEM

Citation

Shaffner, T. (2000), Semiconductor Characterization and Analytical Technology, Proceedings of the IEEE (Accessed June 17, 2024)

Issues

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Created September 1, 2000, Updated February 17, 2017