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Selected Area channeling Pattern and Defect Etch Study of Silicon Implanted with Oxygen, MIcrobeam Analysis - 1988

Published

Author(s)

Peter Roitman, G. E. Davis
Proceedings Title
Proc., 22nd Annual Conference, Materials Analysis Society
Conference Dates
August 8-12, 1988
Conference Location
Milwaukee, WI, USA

Citation

Roitman, P. and Davis, G. (1988), Selected Area channeling Pattern and Defect Etch Study of Silicon Implanted with Oxygen, MIcrobeam Analysis - 1988, Proc., 22nd Annual Conference, Materials Analysis Society, Milwaukee, WI, USA (Accessed June 18, 2024)

Issues

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Created December 30, 1988, Updated October 12, 2021