Roitman, P.
and Davis, G.
(1988),
Selected Area channeling Pattern and Defect Etch Study of Silicon Implanted with Oxygen, MIcrobeam Analysis - 1988, Proc., 22nd Annual Conference, Materials Analysis Society, Milwaukee, WI, USA
(Accessed January 19, 2025)
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Selected Area channeling Pattern and Defect Etch Study of Silicon Implanted with Oxygen, MIcrobeam Analysis - 1988
Published
Author(s)
, G. E. Davis
Proceedings Title
Proc., 22nd Annual Conference, Materials Analysis Society
Conference Dates
August 8-12, 1988
Conference Location
Milwaukee, WI, USA
Pub Type
Conferences
Citation
Issues
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Created December 30, 1988, Updated October 12, 2021